中国空间科学技术

中国空间科学技术 ›› 2025, Vol. 45 ›› Issue (5): 160-169.

• 论文 • 上一篇    

电推进等离子体对C55导线绝缘材料的溅射机理研究

于博1,2,*，邓若男1，张广川3，张岩1,2   

  1. 1.上海空间推进研究所，上海201112
    2.空间高效能推进技术及应用全国重点实验室，上海201112
    3.北京航空航天大学 宇航学院，北京100191
  • 收稿日期:2024-08-15 修回日期:2024-10-16 录用日期:2024-10-30 发布日期:2025-09-17 出版日期:2025-10-25

Sputtering mechanism of C55 wire insulation materials by electric-propulsion plasma

YU Bo1,2,*，DENG Ruonan1，ZHANG Guangchuan3，ZHANG Yan1,2   

  1. 1.Shanghai Institute of Space Propulsion, Shanghai 201112, China
    2.State Key Laboratory of Advanced Space Propulsion, Shanghai 201112, China
    3.School of Astronautics，Beihang University, Beijing 100191, China
  • Received:2024-08-15 Revision received:2024-10-16 Accepted:2024-10-30 Online:2025-09-17 Published:2025-10-25

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摘要： 电推进等离子体对C55导线绝缘层的溅射影响对航天器安全运行有重要意义，绝缘层遭到破坏的导线可引起气体击穿短路或导线间短路，严重影响飞行器的在轨工作可靠性。为研究相关的溅射机理，开展Xe等离子体对聚四氟乙烯（C55导线绝缘材料）的溅射试验。具体地，采用石英晶体微量天平（QCM）测量及推算靶材的固态物溅射产额，采用电子称重天平测量及推算靶材的总溅射产额，采用场发射扫描电镜测量QCM表面收集物和真空舱排出尾气的元素成分，在获取上述测量数据和变化规律后，推断Xe等离子体对聚四氟乙烯的溅射产物以及相关溅射机理。试验结果如下：当离子入射能量不断升高时，会产生不同的溅射产物，在10eV以内，溅射产物主要是-［CF2］-长链结构（固态），当入射能量高于10eV时，会产生-［CF2］-短链结构（气态），并且整个过程中的固态物溅射产额会出现先升高、再下降又升高的趋势，这种变化趋势与-［CF2］-长链脱离速度和裂解速度变化的单调性差异有关。研究揭示了等离子体对聚四氟乙烯溅射作用的物理机制，即溅射机理与产物有很大关系，进而可对溅射产额产生显著影响，该机理可为后续建立等离子体聚四氟乙烯的溅射产额预估模型提供理论基础。

关键词: 电推进等离子体, 聚四氟乙烯, 气态溅射产物, 溅射机理, 溅射试验

Abstract: The impact of the electric-propulsion plasma sputtering onto the insulation layer of C55 wire has exerted a great significance on the spacecraft safety, and the conductor with damaged insulation layer can cause short circuit of gas breakdown or between conductors. These impacts seriously reduce the reliability of the on-orbit operation for aircraft. In order to study the relevant sputtering mechanism, a sputtering test of polytetrafluoroethylene (C55 wire insulation material) by Xe plasma is conducted. Specifically, the quartz crystal microbalance (QCM) is employed to measure the solid sputtering yield of the target, the electronic weighing balance is employed to measure the total sputtering yield of the target, and the field emission scanning electron microscope is used to measure the element composition of the QCM surface collection and the exhaust gas of the vacuum chamber. Based on the above measurement data and its variation rule, the sputtering products and relevant mechanism of Xe plasma on polytetrafluoroethylene is deduced. The results show that, as the incident energy of ions increasing, different sputtering products can be generated, that only -［CF2］- long-chains (solid state) is generated with the incident energy less than 10eV, and that both the -［CF2］- short-chains and the -［CF2］- long-chains are generated. During the entire increase in incident energy, the sputtering yield of solid objects first increases, then decreases, and then increases again, and this trend is probably related to the different monotonicity between the long-chain -［CF2］- detachment velocity and cleavage velocity. The present study reveals the plasma-polytetrafluoroethylene sputtering mechanism that has a high correlation with the sputtering products and conducts a remarkable influence on the sputtering yield.Finally, this study can provide the theoretical foundation for the subsequent research of plasma-polytetrafluoroethylene sputtering yield simulation model.

Key words: electric-propulsion plasma, polytetrafluoroethylene, gaseous sputtering product, sputtering mechanism, sputtering test